Career Path

Alison joined the lab in 2018 to bring expertise in residual stress in thin films to LDRD efforts developing new coatings and coating capabilities relevant to HED/ICF experiments. In addition to film deposition and characterization, Alison performs Monte Carlo modeling of gas phase transport processes with TRIM and SiMTra software to improve the design of sputtering experiments. Other interests include crystallography, radiation damage, and using Machine Learning to process and interpret large datasets.

Research Interests

• Physical vapor deposition (PVD) film growth methods, with a focus on high power impulse magnetron sputtering (HiPIMS)
• Novel coating development and advanced characterization for HED/ICF experiments
• Residual stresses in films and coatings
• Monte Carlo atomistic modeling of gas phase transport and material microstructure
• Machine Learning methods and applications for data analysis

Ph.D., Engineering, Brown University, 2017

M.S., Engineering, Brown University, 2012

B.S., Materials Science and Engineering, Massachusetts Institute of Technology, 2009

Selected publications

 

1. S.J Shin, J.H. Bae, A.M. Engwall, L. B. Bayu Aji, A.A. Baker, G.V. Taylor, J.B. Merlo, L.R. Sohngen, J.D. Moody, and S.O. Kucheyev. "Deposition of ultrathick heavy-metal alloys on rotating substrates by high-power impulse magnetron sputtering: Target erosion effects." Journal of Applied Physics 135(3) (2024) 035301.
2. S.O. Kucheyev, S.J. Shin, L.B. Bayu Aji, J.H. Bae, A.M. Engwall, G.V. Taylor. “Development of new magnetron sputter deposition processes for laser target fabrication,” Fusion Science and Technology, 79(7) (2023) 823-840.
3. H. Sio, J.D. Moody, B.B. Pollock, D.J. Strozzi, D.D. Ho, C.A. Walsh, G.E. Kemp, B. Lahmann, S.O. Kucheyev, B. Kozioziemski, E.G. Carroll, J. Kroll, D.K. Yanagisawa, J. Angus, B. Bachmann, A.A. Baker, L.B. Bayu Aji, S.D. Bhandarkar, J.D. Bude, L. Divol, A.M. Engwall, B. Ferguson, J. Fry, L. Hagler, E. Hartouni, M.C. Herrmann, W. Hsing, D.M. Holunga, J. Javedani, A. Johnson, S. Khan, D. Kalantar, T. Kohut, B.G. Logan, N. Masters, A. Nikroo, N. Izumi, N. Orsi, K. Piston, C. Provencher, A. Rowe, J. Sater, S.J. Shin, K. Skulina, W.A. Stygar, V. Tang, S.E. Winters, G. Zimmerman, J.P. Chittenden, B. Appelbe, A. Boxall, A. Crilly, S. O'Niell, D. Barnak, J. Davies, J. Peebles, J.H. Bae, K. Clark, M. Havre, M. Mauldin, M. Ratledge, S. Vonhof, P. Adrian, B. Reichelt, S. Fujioka, M. Fraenkel. “Performance scaling with an applied magnetic field in indirect-drive inertial confinement fusion implosions,” Physics of Plasmas 30 (2023) 072709.
4. S.J. Shin, L.B. Bayu Aji, A.M. Engwall, J.H. Bae, A.A. Baker, J.D. Moody, S.O. Kucheyev. “Reactive co-sputtering of ternary Au–Ta–O films with tunable electrical resistivity,” Applied Physics Letters 121(14) (2022) 141903.
5. S.J. Shin, L.B. Bayu Aji, J.H. Bae, A.M. Engwall, M.H. Nielsen, J.A. Hammons, X.B. Zuo, B. Lee, X. Lepro, P.B. Mirkarimi. “Oblique angle deposition of boron carbide films by magnetron sputtering,” Journal of Applied Physics. 130(12) (2021) 125305.
6. J. H. Bae, L. B. Bayu Aji, S. J. Shin, A. M. Engwall, M. H. Nielsen, A. A. Baker, S. K. McCall, J. D. Moody, S. O. Kucheyev. “Gold-tantalum alloy films deposited by high-density-plasma magnetron sputtering,” Journal of Applied Physics 130(16) (2021) 165301.
7. Engwall, A. M., L. B. Bayu Aji, A. A. Baker, S. J. Shin, J. H. Bae, S. K. McCall, J. D. Moody, and S. O. Kucheyev. “Effect of substrate tilt on sputter-deposited AuTa films.” Applied Surface Science 547 (2021) 149010.
8. Bayu Aji, L. B., A. M. Engwall, J. H. Bae, A. A. Baker, J. L. Beckham, S. J. Shin, X. Lepro Chavez, S. K. McCall, J. D. Moody, and S. O. Kucheyev. “Sputtered Au-Ta films with tunable electrical resistivity.” Journal of Physics D: Applied Physics 54(7) (2020) 075303. 
9. Engwall, A. M., L. B. Bayu Aji, S. J. Shin, P. B. Mirkarimi, J. H. Bae, and S. O. Kucheyev. “Sputter-deposited low-stress boron carbide films.” Journal of Applied Physics 128(17) (2020) 175301.
10. Engwall, A. M., S. J. Shin, J. Bae, and Y. M. Wang. "Enhanced Properties of Tungsten Films by High-Power Impulse Magnetron Sputtering." Surface and Coatings Technology 363 (2019): 191-197.
11. Chason, E., A. M. Engwall, Z. Rao, and T. Nishimura. "Kinetic Model for Thin Film Stress Including the Effect of Grain Growth." Journal of Applied Physics 123, no. 18 (2018): 185305.
12. Engwall, A. M., Z. Rao, and E. Chason. "Origins of Residual Stress in Thin Films: Interaction between Microstructure and Growth Kinetics." Materials and Design 110 (2016): 616-23.

For a full list, see: Google Scholar | ResearchGate | Scopus | ORCID

For a full list, see: <a href="https://scholar.google.com/citations?hl=en&user=QDHXGBAAAAAJ&view_op=list_works&sortby=pubdate">Google Scholar</a> | <a href="https://orcid.org/0000-0001-5608-9217">ORCID</a>

• 2021 NIF and Photon Science Award for successful development of Au-Ta hohlraums.
• 2021 WCI Bronze Award in recognition of successful development of Au-Ta hohlraums.
• 2018 NIF and Photon Science Award in recognition of extraordinary commitment for highlighting a possible safety hazard associated with new equipment installation.